- List
- Wassenaar Arrangement – List of Dual-Use Goods and Technologies – WA-LIST (25) 1
- Corresponding EU entry
- 3C002
a. Resists designed for semiconductor lithography as follows:
1. Positive resists adjusted (optimised) for use at wavelengths less than 193 nm but equal to or greater than 15 nm;
2. Resists adjusted (optimised) for use at wavelengths less than 15 nm but greater than 1 nm;
b. All resists designed for use with electron beams or ion beams, with a sensitivity of 0.01 µcoulomb/mm² or better;
c. Not used since 2012
d. All resists optimised for surface imaging technologies;
e. All resists designed or optimised for use with imprint lithography equipment specified in 3.B.1.f.2. that use either a thermal or photo-curable process.
1. Positive resists adjusted (optimised) for use at wavelengths less than 193 nm but equal to or greater than 15 nm;
2. Resists adjusted (optimised) for use at wavelengths less than 15 nm but greater than 1 nm;
b. All resists designed for use with electron beams or ion beams, with a sensitivity of 0.01 µcoulomb/mm² or better;
c. Not used since 2012
d. All resists optimised for surface imaging technologies;
e. All resists designed or optimised for use with imprint lithography equipment specified in 3.B.1.f.2. that use either a thermal or photo-curable process.